4. Emissions reduction solution (optional) An optional exhaust recirculation system reduces total emissions by 65%, ensuring clean equipment operation to support ESG measures. 1. Based on …

1. High Throughput The FC-3100 is capable of achieving a high throughput of 1,000 wafers per hour, which has been realized by incorporating a high throughput buffer module and a high-speed transfer …

1. High Throughput The development of an advanced transport system and a proprietary algorithm improves throughput by around two times compared to the conventional SS-3100. This delivers high …

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Single Wafer Cleaner SU-3400 The Evolution of the World's No. 1* Cleaning Equipment * Based on SCREEN in-house research

To address this issue, as a leader in semiconductor production equipment, the SCREEN Group has developed an innovative technology for reducing organic wastewater with the potential to …

This page provides materials for SCREEN Holdings’ shareholders and investors. It contains a range of information, including details of shareholders meetings, management policies, share prices and …

1. These systems enable half-pitch transfer of wafers. The size of baths has been reduced to minimize the volume of chemicals and DI water used. 2. The CHB chemical circulation bath allows processing …

SCREEN Semiconductor Solutions have been developing single-wafer cleaning equipment since 1983. Since then, we have long evolved the technology by pursuing optimal treatment of the air-liquid …

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