Unsure of who to believe; who to trust; afraid you may be losing your mind--sounds like you're in one of these classic ...

In this study, we demonstrated an approach to evaluate the post-etching damage in SiOCH organosilica ultra-low-k dielectric films. Upon plasma dry etching, the ultra-low-k materials were etched by ...

This paper reports research performed on developing and optimizing a process recipe for the plasma etching of deep high-aspect ratio features into silicon carbide (SiC) material using an ...